Core Technologies
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Columbus 1.0.1 (Thickness prediction)
- Real time growth monitoring - Data enhanced A.I. Algorithm - Accuracy 99.2% - Performance can be verified with little data - Derived feature importance |
Columbus 1.0.2 (C/M/E skew prediction)
- Accuracy : 99.6% - Check the real-time prediction results of the deposition process - Derived feature importance |
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Columbus 1.0.3 (Mapping)
- Prediction wafer 49points Mapping - Accuracy : 99.8% - Avg. RMSE : 0.007 |
Columbus 1.0.4 (Process Abnormality detection)
- Abnormality detection (challenging 1 wafer loss) - Real-time detection of target direct change in case of process abnormality - Statistical-based SPC abnormality detection out |
Prediction of Semiconductor Deposition
Columbus 1.0.0 is data enhanced AI Algorithm based on ALD Algorithm learning, ALD Kinetics, Growth Mechanism, Langmuir model, and precursor Physics. Using small data, we can predict ALD deposition and get immediate response for a new abnormality. Furthermore, Real-time learning is possible.
[TaN ALD Real Time Thickness Growth Display]
[TaN ALD Real Time Sheet Resistance Display]
[TaN Thickness abnormality detection]
